标签:pen tin for access create load connect open rmi
To software:Design rules for placement and routing
interconnect resistance /capacitance data for generate RC valuse and wireload models for design
process information for metal interconnect layers:include metal thickness/metal resistance/line-to-line capacitance values of metal layers,for determining coupling capacitance
Using LEF to create Technology Information
Using OpenAccess to create Technology Information
标签:pen tin for access create load connect open rmi
原文地址:https://www.cnblogs.com/lelin/p/11992713.html